Electron beam and deep ultraviolet photoresist   


BRAND

PLACE OF ORIGIN

MODEL

EXPOSURE

CHARACTERISTIC

Micro Resist

Germany

ma-N2400series

Electron beam and deep ultraviolet exposure

Electron beam and deep UV sensitive; very suitable as a etching mask, excellent resistance to dry and wet engraving; well patterned thermal stability; excellent pattern resolution below -50 nm; under alkaline aqueous solution;

mr-EBL 6000

Electron beam exposure

Electron beam and deep UV sensitive; very suitable as a etching mask, excellent resistance to dry and wet engraving; well patterned thermal stability; excellent pattern resolution below -80 nm; under alkaline aqueous solution.



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商品信息

  • 商品名称:

    Electron beam exposure adhesive
  • 商品编号:

    ECS000022
  • 上架时间:

    2018-07-07
  • 商品重量:

    0克
  • 商品库存:

    1
Price:$0 Stock:0 piece

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