Heat resistance temperature =110 ℃
Wet etching, reactive ion beam etching, ion implantation, electroplating
0.5～50μmThickness of glue
It is very suitable for etching mask, excellent anti drying and wet etching properties.
Excellent electroplating properties (extremely high stability in acid and alkaline bath).
The thermal stability of the photoresist pattern is good; it develops under alkaline aqueous solution.
Broadband, G, or I line exposure